发明名称 |
COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF |
摘要 |
A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials. |
申请公布号 |
WO2005041255(A3) |
申请公布日期 |
2009.04.02 |
申请号 |
WO2004US25231 |
申请日期 |
2004.08.04 |
申请人 |
HONEYWELL INTERNATIONAL, INC.;KENNEDY, JOSEPH;STUCK, JASON |
发明人 |
KENNEDY, JOSEPH;STUCK, JASON |
分类号 |
C04B41/50;H01L |
主分类号 |
C04B41/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|