发明名称 |
MOS transistor on an SOI substrate with a body contact and a gate insulating film with variable thickness |
摘要 |
It is an object to provide an SOI device capable of carrying out body fixation and implementing a quick and stable operation. A gate insulating film (11) having a thickness of 1 to 5 nm is provided between a portion other than a gate contact pad (GP) of a gate electrode (12) and an SOI layer (3), and a gate insulating film (110) having a thickness of 5 to 15 nm is provided between the gate contact pad (GP) and the SOI layer (3). The gate insulating film (11) and the gate insulating film (110) are provided continuously.
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申请公布号 |
US7504291(B2) |
申请公布日期 |
2009.03.17 |
申请号 |
US20070929626 |
申请日期 |
2007.10.30 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
MAEDA SHIGENOBU;MATSUMOTO TAKUJI;IWAMATSU TOSHIAKI;IPPOSHI TAKASHI |
分类号 |
H01L21/84;H01L27/08;H01L21/336;H01L21/8238;H01L27/092;H01L27/12;H01L29/423;H01L29/786 |
主分类号 |
H01L21/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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