发明名称 |
Lithographic projection apparatus with collector including concave and convex mirrors |
摘要 |
An optical system includes a radiation source and at least one collector located in the vicinity of the radiation source. The collector is arranged to collect the radiation to provide a beam of radiation. The at least one collector includes a first reflector on a concave surface and a second reflector on a convex surface, the concave surface surrounding the convex surface.
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申请公布号 |
US7489385(B2) |
申请公布日期 |
2009.02.10 |
申请号 |
US20040817969 |
申请日期 |
2004.04.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE VADIM YEVGENYEVICH |
分类号 |
G02B17/06;G03B27/54;G03F7/20;H01L21/027 |
主分类号 |
G02B17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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