发明名称 |
METHOD TO MANUFACTURE A THIN FILM RESISTOR |
摘要 |
A method for manufacturing a semiconductor device that method comprises forming a thin film resistor by a process that includes depositing a resistive material layer on a semiconductor substrate. The process also includes depositing an insulating layer on the resistive material layer, and performing a first dry etch process on the insulating layer to form an insulative body. The process further includes performing a second dry etch process on the resistive material layer to form a resistive body. The resistive body and the insulative body have substantially identical perimeters.
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申请公布号 |
US2009023263(A1) |
申请公布日期 |
2009.01.22 |
申请号 |
US20070779465 |
申请日期 |
2007.07.18 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
PHAN TONY;FLESSNER KYLE M.;MOLLAT MARTIN B.;WANG CONNIE;PAN ARTHUR;BEACH ERIC WILLIAM;KERAMIDAS MICHELLE R.;BURKS KAREN ELIZABETH |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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