发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
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申请公布号 |
US2009021707(A1) |
申请公布日期 |
2009.01.22 |
申请号 |
US20080230979 |
申请日期 |
2008.09.09 |
申请人 |
ASML NETHERLANDS B.V.;CARLZEISS SMT AG |
发明人 |
MULKENS JOHANNES CATHARINUS HUBERTUS;BASELMANS JOHANNES JACOBUS MATHEUS;GRAUPNER PAUL;LOOPSTRA ERIK ROELOF;STREEFKERK BOB |
分类号 |
G03B27/52;G02B3/14;G02B21/33;G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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