发明名称 SEMICONDUCTOR EVALUATION ELEMENT, SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND EVALUATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor evaluation element, together with an evaluation circuit and evaluation method that use the same, capable of analytically estimating the DC fluctuated amount of an MOS transistor caused by formation of contact. SOLUTION: A semiconductor evaluation element, such as, an MOS transistor has a gate, a diffusion layer, a measureming contact, and a floating contact. The diffusion layer is formed on both sides of the gate, to be the source and the drain. The measuring contacts are provided respectively at positions separated away from the gate of the diffusion layer. The floating contact is provided between the gate and the measuring contact and connects the electrically an isolated metal layer and the diffusion layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009010135(A) 申请公布日期 2009.01.15
申请号 JP20070169564 申请日期 2007.06.27
申请人 NEC ELECTRONICS CORP 发明人 NARITA KATAHISA
分类号 H01L21/66;H01L21/822;H01L27/04 主分类号 H01L21/66
代理机构 代理人
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