| 摘要 |
An exposure apparatus for use in optical lithography can include a holder and a plurality of UV-LED modules carried by the holder and disposed in an array. A respective plurality of collimating lenses can be disposed in an array corresponding to the array of UV-LED modules. The plurality of UV-LED modules and the respective plurality of collimating lenses can provide a respective plurality of distinct beams of UV light. The plurality of collimating lenses may be spaced from the plurality of UV-LED modules and spaced from the exposure plane and have an optical configuration providing a composite beam of UV light formed from the plurality of distinct beams of UV light in which each beam inside the periphery of the array overlaps each adjacent beam by at least 70% at the exposure plane. A method for directing light onto an exposure plane in an optical lithography procedure is provided.
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