发明名称 TREATMENT APPARATUS USING SUBCRITICAL WATER
摘要 PROBLEM TO BE SOLVED: To provide a treatment apparatus using subcritical water, from which a treating liquid being the subcritical water, in which a solid particle and a sticky substance are incorporated, can be discharged continuously. SOLUTION: The treatment apparatus using subcritical water is provided with: a vertical reaction vessel in which the object to be treated is treated with the subcritical water; an introduction line for introducing the object to be treated into the vertical reaction vessel; and a discharge line which is arranged on a side wall of the vertical reaction vessel and inclined downward. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008253880(A) 申请公布日期 2008.10.23
申请号 JP20070095843 申请日期 2007.03.31
申请人 OSAKA INDUSTRIAL PROMOTION ORGANIZATION;MITSUBISHI NAGASAKI MACH CO LTD 发明人 YOSHIDA HIROYUKI
分类号 B01J3/00;B09B3/00;C02F11/08;C08J11/14 主分类号 B01J3/00
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