| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure system which enhances the instrumentation accuracy of a surface location of a substrate. SOLUTION: The exposure system has a projection optical system which projects light from an original plate for exposing the substrate via the projection optical system, and further has an instrument and a controller. The instrument measures a surface location of the substrate in the optical axis direction of the projection optical system concerning a measurement point in a shot arranged in the substrate. The controller causes the instrument to measure the surface location in a plurality of shots arranged in the substrate concerning each of a plurality of magnitudes at the measurement points. The instrument calculates an index indicating the repeatability of measurement concerning each of the plurality of magnitudes based on the measured location, and decides a magnitude of the measurement point based on the calculated index. COPYRIGHT: (C)2009,JPO&INPIT
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