<p>The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula (I), where R<SUP>1</SUP> is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.</p>
