发明名称 ABSOLUTE CALIBRATION OF VACUUM GAUGE BY In-Situ METHOD, COMPARISON CALIBRATION DEVICE, AND ITS CALIBRATION METHOD
摘要 PROBLEM TO BE SOLVED: To permit absolute calibration and comparison calibration in one device In-Situ. SOLUTION: In the development of a device capable of performing comparison calibration of a vacuum gauge according to an In-Situ orifice gas flow control method without moving the vacuum gauge using a standard vacuum gauge subjected to absolute calibration by a standard instrument of a static method for calculating the pressure of a vacuum chamber by sequentially expanding the gas into vacuum chambers having mutually different volumes, the detailed technique includes standard vacuum gauge absolute calibration by the static method, vacuum gauge comparison calibration combining technique by the orifice gas flow control method, standard pressure generation technique from a low-vacuum region to a high-vacuum region and calibration technique, and technique regarding vacuum gauge comparison calibration by an orifice gas flow stabilization method. The present invention relates to shortening of calibration time and improvement in calibration efficiency such as movement calibration, for developing a new device which is a combination of two calibration devices, in contrast to the case that absolute calibration of the vacuum gauge and the comparison calibration are permitted only in separate devices, respectively. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007121267(A) 申请公布日期 2007.05.17
申请号 JP20060140047 申请日期 2006.05.19
申请人 KOREA RESEARCH INST OF STANDARDS & SCIENCE 发明人 HONG SEUNG SOO;SHIN YONG-HYEON;JUNG KWANG HWA;LIM IN TAE
分类号 G01L27/00 主分类号 G01L27/00
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