发明名称 ALTERNATIVE PHASE-SHIFTING MASK AND MANUFACTURING METHOD THEREOF
摘要 A method of manufacturing an alternative phase-shifting mask, includes forming first and second patterns on a transparent substrate to be adjacent to each other, the first and second patterns are transmittable and the second pattern having a recessed portion of the substrate for phase-shifting. A laser light is irradiated to sidewall portions of the recessed portion to modify the sidewall portions such that a transmittance of the sidewall portions to exposure light is lower than that of a bottom portion of the recessed portion.
申请公布号 US2008299466(A1) 申请公布日期 2008.12.04
申请号 US20080131266 申请日期 2008.06.02
申请人 NEC ELECTRONICS CORPORATION 发明人 INOUE TAKASHI
分类号 G03F1/30;G03F1/68;H01L21/027 主分类号 G03F1/30
代理机构 代理人
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