发明名称 |
ALTERNATIVE PHASE-SHIFTING MASK AND MANUFACTURING METHOD THEREOF |
摘要 |
A method of manufacturing an alternative phase-shifting mask, includes forming first and second patterns on a transparent substrate to be adjacent to each other, the first and second patterns are transmittable and the second pattern having a recessed portion of the substrate for phase-shifting. A laser light is irradiated to sidewall portions of the recessed portion to modify the sidewall portions such that a transmittance of the sidewall portions to exposure light is lower than that of a bottom portion of the recessed portion.
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申请公布号 |
US2008299466(A1) |
申请公布日期 |
2008.12.04 |
申请号 |
US20080131266 |
申请日期 |
2008.06.02 |
申请人 |
NEC ELECTRONICS CORPORATION |
发明人 |
INOUE TAKASHI |
分类号 |
G03F1/30;G03F1/68;H01L21/027 |
主分类号 |
G03F1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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