发明名称 |
METHOD OF ADJUSTING LASER BEAM OUTPUT, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING DISPLAY DEVICE, AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To reduce intensity deviation in each laser output without being affected by a difference, such as a difference in the depth of focus in each laser beam irradiation optical system, in parallel irradiation of a plurality of laser beams. SOLUTION: Prior to parallel irradiation of laser beams to a body to be irradiated with laser beams by a plurality of laser irradiation optical units, optical characteristics are measured in the body to be irradiated with laser beams after irradiation with laser beams by respective laser irradiation optical units. Based on the measured results, laser beam output from each laser irradiation optical unit is adjusted so that the difference in the optical characteristics for each laser irradiation optical unit is within a prescribed range. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008288363(A) |
申请公布日期 |
2008.11.27 |
申请号 |
JP20070131451 |
申请日期 |
2007.05.17 |
申请人 |
SONY CORP |
发明人 |
UMETSU NOBUHIKO;TATSUKI KOICHI;INAGAKI TAKAO;TSUKIHARA KOICHI;MATSUNOBU TAKESHI |
分类号 |
H01L21/268;H01L21/20;H01L21/336;H01L29/786 |
主分类号 |
H01L21/268 |
代理机构 |
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地址 |
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