SUBSTRATE PROCESSING APPARATUS

摘要

It can be prevented from the processing liquid from dropping on the substrate from the nozzle member. The quality of substrate can be improved. The substrate processing apparatus(1) comprises as follows. The liquid knife(16) discharges slantly the rinse liquid from the upper stream to the down stream side in the upper side of the substrate(S). The gas spraying means includes the air nozzle(32) spraying the air towards the liquid knife. The air is sprayed on the liquid knife from the air nozzle by the controller(40) when the substrate does not exist under the liquid knife.