Novel Polymer, Positive Resist Composition, and Patterning Process Using the Same,申请号KR20040080038-传众专利搜索

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发明名称	Novel Polymer, Positive Resist Composition, and Patterning Process Using the Same
摘要
申请公布号	KR100865997(B1)	申请公布日期	2008.10.29
申请号	KR20040080038	申请日期	2004.10.07
申请人		发明人
分类号	G03F7/004;C07C69/54;C08F220/18;C08F220/28;G03C1/76;G03F7/039	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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