发明名称 CONTROLLED ZONE MICROWAVE PLASMA SYSTEM
摘要 An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.
申请公布号 WO2007143301(A3) 申请公布日期 2008.10.02
申请号 WO2007US67860 申请日期 2007.05.01
申请人 BWXT Y-12, LLC;RIPLEY, EDWARD, B.;SEALS, ROLAND, D.;MORRELL, JONATHAN, S. 发明人 RIPLEY, EDWARD, B.;SEALS, ROLAND, D.;MORRELL, JONATHAN, S.
分类号 C23C16/00;C23F1/00;H01L21/306 主分类号 C23C16/00
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