发明名称 X-RAY EXAMINATION APPARATUS AND X-RAY EXAMINATION METHOD USING THE SAME
摘要 An X-ray examination apparatus changes a position of each X-ray sensor by rotating a sensor base, and resets a starting position of X-ray emission that becomes a X-ray focal position so that the X-ray enters each X-ray sensor after the position thereof is changed. A scanning X-ray source deflects an electron beam to easily change the position where the electron beam impinges a target of the X-ray source to an arbitrary location. The irradiating position of the electron beam then can be easily moved according to an accumulated irradiation time on the target. Therefore, maintenance can be performed without interrupting the X-ray examination.
申请公布号 US2008226035(A1) 申请公布日期 2008.09.18
申请号 US20080048852 申请日期 2008.03.14
申请人 OMRON CORPORATION 发明人 MASUDA MASAYUKI;MATSUNAMI TSUYOSHI;KOIZUMI HARUYUKI
分类号 G21K1/00 主分类号 G21K1/00
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