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发明名称
Chemical and mechanical polishing method and polishing liquid used therefor
摘要
申请公布号
EP1705701(A3)
申请公布日期
2008.08.20
申请号
EP20060005984
申请日期
2006.03.23
申请人
FUJIFILM CORPORATION
发明人
AKATSUKA, TOMOHIKO
分类号
H01L21/321;B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/768
主分类号
H01L21/321
代理机构
代理人
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