THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME

摘要

A thin film transistor and a manufacturing method thereof are provided to change doping level for respective semiconductor layer regions by adjusting thickness and location of first, second, and third insulation layers. A thin film transistor comprises a lower structure(11), a semiconductor layer(12), first and second insulation layers(14a,14b), and a third insulation layer(16), and a gate electrode layer(17). The semiconductor layer includes a plurality of doped regions(12b,12c,12d) on the lower structure. The first and second insulation layers are formed on the semiconductor layer, separated from each other. The third insulation layer is formed on the first and second insulation layers. The gate electrode layer is formed on the third insulation layer between the first and second insulation layers. The width of the third insulation layer is longer than that between the first and second insulation layers and shorter than that between the left part of the first insulation layer and the right part of the second insulation layer.