发明名称 |
Radiation system and lithographic apparatus |
摘要 |
The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.
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申请公布号 |
US7397538(B2) |
申请公布日期 |
2008.07.08 |
申请号 |
US20060602475 |
申请日期 |
2006.11.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOX WILHELMUS JOSEPHUS;KLUNDER DERK JAN WILFRED;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;DRIESSEN NIELS MACHIEL;SCHIMMEL HENDRIKUS GIJSBERTUS |
分类号 |
G03B27/54;G03B27/42;G21G5/00 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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