| 摘要 |
<p>An exposure mask and a method for manufacturing a semiconductor device are provided to simplify the manufacturing process by preventing generation of scum without a de-scum process. An exposure mask includes a transparent substrate(220) and a light shielding pattern(210) formed on the transparent substrate corresponding to a bit line contact region. A method for manufacturing a semiconductor device includes the steps of forming a negative photoresist layer on a semiconductor substrate including a gate pattern, exposing the negative photoresist layer, and forming a photoresist pattern(170) to expose the bit line contact region by performing a developing process.</p> |
