摘要 |
<p>An aligner comprising a stage (13) having an upper surface (13a) for mounting a color filter substrate (11), a mask stage (6) arranged above the stage (13) such that a stripe photomask (5) can be held on the upper surface of the stage (13) in parallel therewith, and a light source (2) for irradiating the photomask (5) held on the mask stage (6) with exposure light, and forming a predetermined exposure pattern at a predetermined position by irradiating the color filter substrate (11) with exposure light radiated from the light source (2) through the photomask (5). A cylindrical lens (14) for shaping the cross-sectional profile of the beams of exposure light radiated from the light source (2) in accordance with the profile of the stripe photomask (5) is arranged on the optical path between the light source (2) and the mask stage (6). Consequently, utilization efficiency of exposure light radiated for the stripe photomask is enhanced.</p> |