发明名称 ELECTRODE STRUCTURE AND METHOD FOR FORMING BUMP
摘要 Disclosed is an electrode structure (100) on which a solder bump is placed. This electrode structure (100) comprises an electrode pattern (50) made of an electrode-constituting material selected from the group consisting of Cu, Al, Cr and Ti, a Ni layer (52) formed on a part of the electrode pattern (50), a Pd layer (54) formed on at least a part of the other region of the electrode pattern (50) where the Ni layer (52) is not formed, and a Au layer (56) formed on the Ni layer (52) and the Pd layer (54).
申请公布号 WO2008075537(A1) 申请公布日期 2008.06.26
申请号 WO2007JP72795 申请日期 2007.11.27
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;TANIGUCHI, YASUSHI;NAKATANI, SEIICHI;KITAE, TAKASHI;KARASHIMA, SEIJI;HOTEHAMA, KENICHI 发明人 TANIGUCHI, YASUSHI;NAKATANI, SEIICHI;KITAE, TAKASHI;KARASHIMA, SEIJI;HOTEHAMA, KENICHI
分类号 H01L21/60;H01L23/12;H05K3/34 主分类号 H01L21/60
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