发明名称 LASER GENERATION PLASMA RADIATION SYSTEM EQUIPPED WITH FOIL TRAP
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation system having a foil trap arranged between a collector such as a vertical incidence collector and a (plasma) light source such that radiation from the light source passes the foil trap twice. <P>SOLUTION: Radiation passes a foil trap for the first time before it strikes against a collector, and passes the foil trap for the second time after it is reflected on the collector. This arrangement has been impossible so far. Since the foil trap has a thin plate which is parallel with both the radiation from a light source and the radiation reflected on the collector, the radiation is not interrupted by the foil trap. Consequently, the vertical incidence collector used together with a radiation source formed by plasma can be protected against fragments produced from an EUV source. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008118157(A) 申请公布日期 2008.05.22
申请号 JP20080007810 申请日期 2008.01.17
申请人 ASML NETHERLANDS BV 发明人 BAKKER LEVINUS PIETER;BANINE VADIM YEVGENYEVICH;KURT RALPH;SCHUURMANS FRANK JEROEN PIETER;SIDELNIKOV YURII VICTOROVITCH
分类号 G21K1/00;H01L21/027;G03F7/20;G21K1/06;G21K5/02;H05H1/24 主分类号 G21K1/00
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