| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which substantially avoids degradation of resist pattern profile and degradation of line edge roughness performance in liquid immersion exposure as well as in ordinary exposure (dry exposure), and a pattern forming method using the same. <P>SOLUTION: The photosensitive composition contains a compound (C) represented by formula (I): (R)<SB>n</SB>-N-(A-X)<SB>3-n</SB>, wherein R each independently, when there are a plurality of R's, represents H or a monovalent organic group; A each independently, when there are a plurality of A's, represents a divalent linking group having a bond which is broken by an acid; X each independently, when there are a plurality of X's, represents a monovalent organic group having an alicyclic hydrocarbon structure; and n represents an integer of 0-2. <P>COPYRIGHT: (C)2008,JPO&INPIT |
