| 摘要 |
Disclosed are a processing method and apparatus for removing a native oxide film formed on a surface of an object W. The surface of the object is exposed to activated gases formed from a N 2 gas (52), a H 2 gas (54) and a NF 3 (83) gas to bring about a reaction between the native oxide film formed on the surface of the object and the activated gases. As a result, a reaction film is formed. The reaction film thus formed is sublimated by heating (36) the object to a predetermined temperature, thereby to remove the native oxide film from the surface of the object. For forming the activated gases, the N 2 gas (52) and H 2 gas (54) are converted into a plasma and activated to form active species, followed by adding the NF 3 gas (80) to the active species to form an activated gas containing the NF 3 gas.
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