| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive insulating resin composition that is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film excellent in various properties including resolution, electrical insulation property and thermal shock resistance, and to provide a cured product of the composition and an electronic component having the cured product. <P>SOLUTION: The present photosensitive insulating resin composition comprises an alkali soluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by following general formula (1), and a crosslinking agent. In formula (1), R is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is an oxygen atom or a sulfur atom. <P>COPYRIGHT: (C)2008,JPO&INPIT |
