Production line for semiconductor devices

摘要

A production line includes a centralized cleaning/drying station (14) for cleaning a wafer by using an HF cleaning solution or a non-HF cleaning solution and subsequently drying the wafer based on the desired cleaning/drying conditions, and a transport system for transporting the wafer between each processing station (12A to 12E) and the centralized cleaning/drying station (14). The production line (10) has a large flexibility for selecting the cleaning/drying conditions for the wafer with a reduced system size.