发明名称 Method and apparatus for determining an operation status of a plasma processing apparatus, program and storage medium storing same
摘要 In an operation status determination method for a plasma processing apparatus, a principal component analysis is carried out by using operation status data groups. Processing parameter values in the respective operation status data groups are converted into principal component scores which are plotted in a two-dimensional coordinate system with axes of the selected principal components. A movement vector P from a first recipe operation status data group for reference apparatus to a first recipe operation status data group for target apparatus is calculated. An actually measured normal area A 2 is set, and a predicted normal area B 2 is set by moving the area A 2 along the movement vector P. Then, it is determined whether or not the principal component scores corresponding to the respective processing parameter values when the second recipe is applied to the target apparatus are included in the predicted normal area B 2.
申请公布号 US7341954(B2) 申请公布日期 2008.03.11
申请号 US20060476104 申请日期 2006.06.28
申请人 TOKYO ELECTRON LIMITED 发明人 YAMAZAKI YOSHIHIRO;TANAKA HIDEKI
分类号 H01L21/302 主分类号 H01L21/302
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