发明名称 LEAKAGE IMPROVEMENT FOR A HIGH-VOLTAGE LATCH
摘要 An improved CMOS high-voltage latch stores data bits to be written to memory cells of a non-volatile memory has two cross-coupled CMOS inverters. One of the inverters has a pull-down leg that includes a pass-gate high-voltage NMOS transistor that is connected between a latch output node and a second high-voltage, low-threshold NMOS pull-down transistor that is connected to ground. A gate of the pass-gate high-voltage NMOS transistor receives a standby signal with a logic HIGH value of at most Vdd to turn on the pass-gate high-voltage NMOS transistor when the high-voltage CMOS latch is in a voltage mode of operation and during a high-voltage write mode of operation. The pass-gate high-voltage NMOS transistor thereby limits the voltage across the second high-voltage, low-threshold NMOS pull-down transistor to less than the standby signal in order to reduce punch-trough current and drain-to-substrate leakage of the second high-voltage, low-threshold NMOS pull-down transistor.
申请公布号 US2008054973(A1) 申请公布日期 2008.03.06
申请号 US20060470536 申请日期 2006.09.06
申请人 ATMEL CORPORATION 发明人 CHAN JOHNNY;TSAI JEFFREY MING-HUNG;WONG TIN-WAI
分类号 H03K3/356 主分类号 H03K3/356
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