APPARATUS AND METHOD FOR EXPOSURING BOARD MATERIAL

摘要

An apparatus for exposing a substrate material is provided to guarantee at least twice as much as conventional productivity by performing a dual exposure process using two one-side exposure unit. An unwinding unit(110) supplies a substrate material(10). A first exposure apparatus(100) includes a first exposure unit(120) for performing an exposure process for forming a specific pattern on one surface of the substrate supplied from the unwinding unit. A conversion unit(210) converts the progression direction of the substrate material exposed by the first exposure unit. A second exposure unit(220) performs an exposure process on the other surface of the substrate material reversely progressed by the conversion unit or performs an exposure process for forming the same or different pattern on the same surface of the substrate material exposed by the first exposure unit. A second exposure apparatus(200) includes a winding unit(230) for receiving the substrate material exposed by the second exposure unit. A transfer buffer(300) adjusts the speed of a supplied substrate material, installed between the first and the second exposure apparatuses.