发明名称 Imprint lithography
摘要 A method of making an imprint lithography template includes applying a curable material to a patterned surface of a master imprint template, allowing the curable material to cure and thereby forming a second imprint template having a patterned surface which is the inverse of the patterned surface of the master imprint template; removing the second imprint template from the master imprint template; applying inorganic sol-gel to a substrate; imprinting the inorganic sol-gel with the second imprint template; allowing the inorganic sol-gel to cure; and removing the second imprint template from the cured inorganic sol-gel, such that the inorganic sol-gel forms a third imprint template having a patterned surface which corresponds with the patterned surface of the master imprint template.
申请公布号 US2008011934(A1) 申请公布日期 2008.01.17
申请号 US20060478305 申请日期 2006.06.30
申请人 ASML NETHERLANDS B.V.;KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 VERSCHUUREN MARCUS ANTONIUS;WUISTER SANDER FREDERIK
分类号 B28B7/34;B29C33/40;B29C33/58;C04B33/32;C23F1/00 主分类号 B28B7/34
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