发明名称 |
Imprint lithography |
摘要 |
A method of making an imprint lithography template includes applying a curable material to a patterned surface of a master imprint template, allowing the curable material to cure and thereby forming a second imprint template having a patterned surface which is the inverse of the patterned surface of the master imprint template; removing the second imprint template from the master imprint template; applying inorganic sol-gel to a substrate; imprinting the inorganic sol-gel with the second imprint template; allowing the inorganic sol-gel to cure; and removing the second imprint template from the cured inorganic sol-gel, such that the inorganic sol-gel forms a third imprint template having a patterned surface which corresponds with the patterned surface of the master imprint template.
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申请公布号 |
US2008011934(A1) |
申请公布日期 |
2008.01.17 |
申请号 |
US20060478305 |
申请日期 |
2006.06.30 |
申请人 |
ASML NETHERLANDS B.V.;KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
VERSCHUUREN MARCUS ANTONIUS;WUISTER SANDER FREDERIK |
分类号 |
B28B7/34;B29C33/40;B29C33/58;C04B33/32;C23F1/00 |
主分类号 |
B28B7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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