| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment technology which is used to adjust the temperature of an interior chamber at high heat transmission efficiency in a dual structure treatment chamber. SOLUTION: The plasma treatment apparatus is provided with a vacuum treatment container and a sample stand 201, and high-frequency power is supplied to a treatment gas to generate plasma in a discharging chamber above the sample stand, and then a sample on the sample stand is subject to plasma treatment. In this case, the vacuum treatment container is provided with a lid member 206 to cover the upper opening of the vacuum treatment container, a chamber to house the sample stand, and a cylindrical discharging chamber wall member coupled with the chamber and the lid member. The chamber is provided with an interior chamber 215 to house the sample stand, and an exterior chamber 217 to house the interior chamber with a vacuum space between. The discharging chamber wall member is provided with an inner wall member 213 of the discharging chamber that is opposite to the discharging chamber, an outer wall member 212 of the discharging chamber thermally in contact with the inner wall member 213 and the interior chamber 215. A heating means 301 provided at the periphery of the outer wall member of the discharging chamber is used to heat the inner wall member 213 and the interior chamber 215. COPYRIGHT: (C)2008,JPO&INPIT
|
