WORKPIECE SUPPORTING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a workpiece supporting device capable of preventing reduction of degree of flatness due to undulation of a liquid crystal substrate occurring when processing the liquid crystal substrate thermally by fixing it by a sucking device.

SOLUTION: This workpiece supporting device has a workpiece supporting base (a liquid crystal substrate stage 20) for supporting a plate-like workpiece and a movable workpiece holder (a movable sucking device 1) movable along the direction of face of the workpiece for the workpiece supporting base while holding the workpiece. It is preferable that this workpiece supporting device is provided with the movable workpiece holder 1 and a fixed workpiece holder unmovable relatively for the workpiece supporting base. When a position of the workpiece is changed due to thermal processing, the movable workpiece holder can follow it to prevent occurrence of undulation caused by restraining the workpiece at thermal processing time effectively. Consequently, degree of flatness of the workpiece is maintained, and unevenness in processing is prevented.

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