| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a patterning method in which stock management of mask is not required, and a throughput higher than that of a direct imaging method can be attained easily. <P>SOLUTION: The patterning method comprises (a) a step for drawing an ink image on a photoresist film formed on the surface of a substrate by means of an ink jet printer, (b) a step for exposing the photoresist film using the ink image as a mask, (c) a step for forming a resist pattern by developing the exposed photoresist film, and (d) a step for processing the surface of the substrate using the resist pattern as a mask. <P>COPYRIGHT: (C)2008,JPO&INPIT |
