METHODS FOR MAKING SPUTTERING TARGETS

摘要

The invention includes components containing metallic material. The metallic material can be comprised of a plurality of grains, with substantially all of the grains being substantially equiaxial, and the grains having an average grain size of less than or equal to about 30 microns. The components can be formed by utilization of a uniaxial vacuum hot press together with a starting metallic powder characterized by 325 mesh size. An exemplary component is a sputtering target having a high degree of uniformity across its sputtering face as well as throughout its thickness.