| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser irradiation device which can make light intensity distribution uniform satisfactorily even if a laser with high coherence is employed as a laser light source, and which can be used for an impurity activation procedure that can activate impurities in the depths from a substrate surface of a semiconductor substrate with the impurities added. SOLUTION: The laser irradiation device comprises: a first laser light source emitting a first laser beam as a pulsed laser beam, a second laser light source emitting a second laser beam as a continuous wave laser beam or a pulsed laser beam, a diffractive-optical element performing at least one of shaping of a beam cross-sectional shape of an incident laser beam and homogenizing of light intensity distribution in a beam cross section, and an incident light optical system which allows the first laser beam and the second laser beam to enter different positions with each other on a surface of the diffractive-optical element for a laser beam to enter. COPYRIGHT: (C)2008,JPO&INPIT
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