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发明名称
VARIABLE LENS AND EXPOSURE SYSTEM
摘要
A lithography apparatus comprises variable lenses.
申请公布号
US2007253070(A1)
申请公布日期
2007.11.01
申请号
US20070740121
申请日期
2007.04.25
申请人
ASML NETHERLANDS B.V.
发明人
VENEMA WILLEM J.
分类号
G02B27/12
主分类号
G02B27/12
代理机构
代理人
主权项
地址
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