发明名称 |
METHOD FOR FABRICATION OF LOW-POLARIZATION IMPLANTABLE STIMULATION ELECTRODE |
摘要 |
<p>A method for fabricating an implantable medical electrode includes roughening the electrode substrate, applying an adhesion layer, and depositing a valve metal oxide coating over the adhesion layer under conditions optimized to minimize electrode impedance and post-pulse polarization. The electrode substrate may be a variety of electrode metals or alloys including titanium, platinum, platinum-iridium, or niobium. The adhesion layer may be formed of titanium or zirconium. The valve metal oxide coating is a ruthenium oxide coating sputtered onto the adhesion layer under controlled target power, sputtering pressure, and sputter gas ratio setting optimized to minimize electrode impedance and post-pulse polarization.</p> |
申请公布号 |
EP1848495(A1) |
申请公布日期 |
2007.10.31 |
申请号 |
EP20060719552 |
申请日期 |
2006.01.25 |
申请人 |
MEDTRONIC, INC. |
发明人 |
BRABEC, SCOTT, J.;ROSE, RANDY, G.;NYGREN, LEA, A.;COLES, JAMES, A. JR. |
分类号 |
A61N1/05 |
主分类号 |
A61N1/05 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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