发明名称 PRODUCT WITH INORGANIC ANTIREFLECTION LAYER AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a product with inorganic antireflection layer in which an inorganic antireflection layer is hardly peeled off from a base material, and to provide a manufacturing method of the product with inorganic antireflection layer. <P>SOLUTION: The product with inorganic antireflection layer 10, 10', 10'' includes the base material 1, polysiloxane layer 2, 2', 2'' which is formed on the base material 1 and has a thickness of 1 to 50 nm, and an inorganic antireflection layer 3 formed on the polysiloxane layers 2, 2', 2''. The manufacturing method of the product with inorganic antireflection layer 10, 10', 10'' comprises: a polysiloxane layer forming process of forming polysiloxane layers 2, 2', 2'' by depositing a silane coupling agent on the base material 1; and an inorganic antireflection layer forming process of forming an inorganic antireflection layer 3 by the deposition onto the polysiloxane layers 2, 2', 2''. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007256654(A) 申请公布日期 2007.10.04
申请号 JP20060081164 申请日期 2006.03.23
申请人 SEIKO EPSON CORP 发明人 KATAGIRI KANJI;SHIRASAWA KAZUNORI
分类号 G02B1/11;B32B7/02;B32B9/00;B32B27/00;C23C14/08;C23C16/42 主分类号 G02B1/11
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