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发明名称
HEATING DEVICE OF PURGE GAS FOR SEMICONDUCTOR WAFER
摘要
申请公布号
KR100754827(B1)
申请公布日期
2007.09.04
申请号
KR20050026440
申请日期
2005.03.30
申请人
发明人
分类号
H01L21/02
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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