SUBSTRATE MOUNTING METHOD AND FILM FORMING METHOD FOR FILM FORMING APPARATUS

摘要

A substrate mounting method for a film forming apparatus wherein a vapor source and a chuck (14) facing the vapor source are provided and the substrate is mounted and held by the chuck (14). A glass substrate (26) is placed on a mask (28) arranged between the chuck (14) and the vapor source, the mask (28) is brought close to the chuck (14) with the glass substrate (26), the glass substrate (26) is brought into contact with the chuck (14), and the glass substrate (26) is held.