发明名称 |
Positive resist composition and method of pattern formation with the same |
摘要 |
A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
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申请公布号 |
US2007178405(A1) |
申请公布日期 |
2007.08.02 |
申请号 |
US20060492123 |
申请日期 |
2006.07.25 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KANDA HIROMI;KANNA SHINICHI;INABE HARUKI |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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