发明名称 MANUFACTURING METHOD OF SILICON SUBSTRATE FOR MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a silicon substrate by which floating height of a magnetic recording head can be made lower than before, satisfactory magnetic anisotropy can be obtained in a magnetic recording film and high recording density can be attained. SOLUTION: In a manufacturing method of the silicon substrate having a texture for a magnetic disk, the texture is formed on the surface of the silicon substrate by using texturing selected from the group consisting of (1) texturing of at least two steps using loose abrasive grain slurry including abrasive grains of different raw materials and/or tapes of different materials, (2) texturing of at least two steps using different working pressures and (3) texturing of at least two steps using loose abrasive grain slurry including abrasive grains of different raw materials and/or tapes of different materials and using different working pressures. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007188611(A) 申请公布日期 2007.07.26
申请号 JP20060007437 申请日期 2006.01.16
申请人 SHIN ETSU CHEM CO LTD 发明人 SHINTANI HISAFUMI
分类号 G11B5/84;B24B21/00 主分类号 G11B5/84
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