发明名称 |
Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask |
摘要 |
A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type mask. When second minimum dimension is 1.3 time or more than the first minimum dimension, the exposure amount of the second exposure step is set to be equal to or smaller than the exposure amount of the first exposure step.
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申请公布号 |
US2007141480(A1) |
申请公布日期 |
2007.06.21 |
申请号 |
US20060637698 |
申请日期 |
2006.12.13 |
申请人 |
OKUNO MITSURU;MONIWA AKEMI |
发明人 |
OKUNO MITSURU;MONIWA AKEMI |
分类号 |
G03C5/00;G03F1/30;G03F1/36;G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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