| 摘要 |
In a vacuum chamber (42) comprising a catalyst chamber (46) provided with a catalyst source (48) provided so as to face a film forming chamber (44) and a substrate (S), the film forming chamber (44) is connected to the catalyst chamber (46) through an opening part (47). The catalyst source is disposed at a position satisfying a requirement of omega >= Theta wherein omega represents the angle that a straight line, which shortestly connects the peripheral part of the substrate mounted within the film forming chamber to the peripheral part of the opening part, makes with the substrate; and Theta represents the angle that a straight line, which shortestly connects the peripheral part of the substrate to the edge part of the catalyst source makes with the substrate. The use of this film forming apparatus can realize the formation of a desired film while preventing deactivation of radicals generated in the catalyst source and thus efficiently carrying out a reaction of a starting gas with radicals.
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