| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist pattern forming method excellent in resolution and sensitivity, and a photosensitive resin composition suitable for the pattern forming method. <P>SOLUTION: The resist pattern forming method is characterized in that an alkali developable photosensitive resin composition containing a hydrophilic polymer (A) having an active hydrogen atom-containing group, a polyfunctional acrylate monomer (B), a photo-radical polymerization initiator (C), a photoacid generator (D) and a crosslinking agent (E) is applied and dried on a substrate, selectively exposed, heated at 50-200°C and developed with an alkali developer. <P>COPYRIGHT: (C)2007,JPO&INPIT |
