发明名称 |
MULTI-LAYER MOLD STRUCTURE FOR HOT EMBOSSING |
摘要 |
A multi-layer molding apparatus for hot embossing is provided to achieve improved large area transferring performance of hot embossing by applying uniform pressure all over the molding apparatus. A multi-layer molding apparatus includes a molding layer(110), a cushion layer(120), and a rigidity retention layer(130). The molding layer is constituted by a wafer made of silicon. The wafer has one surface on which fine patterns(111) are formed. The cushion layer has one surface bonded to the other surface of the molding layer, and transforms in correspondence to the pressure generated when a material is pressed by the molding layer. The rigidity retention layer is bonded to the other surface of the cushion layer, and provides a flat reference surface which is not transformed even when the material is pressed by the molding layer.
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申请公布号 |
KR100726724(B1) |
申请公布日期 |
2007.06.04 |
申请号 |
KR20060012635 |
申请日期 |
2006.02.09 |
申请人 |
KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY |
发明人 |
KIM, HEUNG KYU;KO, YOUNG BAE;KANG, JEONG JIN;HONG, SEOK KWAN;HEO, YOUNG MOO |
分类号 |
B29C59/02;B29C43/02;B29C43/20 |
主分类号 |
B29C59/02 |
代理机构 |
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地址 |
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