发明名称 MULTI-LAYER MOLD STRUCTURE FOR HOT EMBOSSING
摘要 A multi-layer molding apparatus for hot embossing is provided to achieve improved large area transferring performance of hot embossing by applying uniform pressure all over the molding apparatus. A multi-layer molding apparatus includes a molding layer(110), a cushion layer(120), and a rigidity retention layer(130). The molding layer is constituted by a wafer made of silicon. The wafer has one surface on which fine patterns(111) are formed. The cushion layer has one surface bonded to the other surface of the molding layer, and transforms in correspondence to the pressure generated when a material is pressed by the molding layer. The rigidity retention layer is bonded to the other surface of the cushion layer, and provides a flat reference surface which is not transformed even when the material is pressed by the molding layer.
申请公布号 KR100726724(B1) 申请公布日期 2007.06.04
申请号 KR20060012635 申请日期 2006.02.09
申请人 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY 发明人 KIM, HEUNG KYU;KO, YOUNG BAE;KANG, JEONG JIN;HONG, SEOK KWAN;HEO, YOUNG MOO
分类号 B29C59/02;B29C43/02;B29C43/20 主分类号 B29C59/02
代理机构 代理人
主权项
地址