发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus, capable of obtaining a normal image by suppressing abnormal contrast due to charge-up, by conducting a destructive inspection, which has been a problem in the conventional technologies, as a non-destructive examination with respect to the charged particle beam device. SOLUTION: The charged particle beam device is provided with a first irradiation means 19 for irradiating charged particles on a test piece, an imaging means which captures and images electrons generated by the test piece, and an impression means 9 for impressing a voltage on the test piece 7. A second irradiation means 20, which can irradiate the same test piece from a different source from the first irradiation means 19, is provided. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007109490(A) 申请公布日期 2007.04.26
申请号 JP20050298357 申请日期 2005.10.13
申请人 JEOL LTD 发明人 OTA SHIGEMASA
分类号 H01J37/28;H01J37/20;H01L21/66 主分类号 H01J37/28
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