发明名称 Thin-film transistor panel having structure that suppresses characteristic shifts and method for manufacturing the same
摘要 A thin-film transistor panel includes a substrate, and a thin-film transistor formed on the substrate. The transistor includes a gate electrode, a gate insulating film, a semiconductor thin film, first and second ohmic contact layers formed on the semiconductor thin film, and source and drain electrodes which are respectively formed on the first and second ohmic contact layers. The semiconductor thin film includes a channel area between the source electrode and the drain electrode. A pixel electrode is connected to the source electrode of the thin-film transistor. First and second conductive coating films are provided on the source and drain electrodes, respectively, and formed of the same material as the pixel electrode. The first conductive coating film is wider than the source electrode, and the second conductive coating film is wider than the drain electrode.
申请公布号 US2007090422(A1) 申请公布日期 2007.04.26
申请号 US20060582886 申请日期 2006.10.18
申请人 CASIO COMPUTER CO., LTD. 发明人 ISHII HIROMITSU
分类号 H01L31/113 主分类号 H01L31/113
代理机构 代理人
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